硅(gui)(gui)-藍輝(hui)石(shi)(shi)由(you)單晶(jing)硅(gui)(gui)隔(ge)熱(re)體設計根據，會(hui)會(hui)出(chu)現(xian)(xian)(xian)(xian)落伍、乏力(li)(li)和(he)(he)應力(li)(li)松弛現(xian)(xian)(xian)(xian)象；藍輝(hui)石(shi)(shi)體現(xian)(xian)(xian)(xian)了是(shi)十分好(hao)的(de)伸縮性和(he)(he)隔(ge)熱(re)性能特點(dian)（1000℃之內(nei)），對溫度(du)因素影(ying)響不強(qiang)烈(lie)，盡管在高熱(re)狀況(kuang)下(xia)，也體現(xian)(xian)(xian)(xian)了非常好(hao)的(de)的(de)工(gong)作(zuo)中性能特點(dian)；藍輝(hui)石(shi)(shi)的(de)抗(kang)散發(fa)性能特點(dian)極(ji)大；另(ling)一方面，硅(gui)(gui)-藍輝(hui)石(shi)(shi)半(ban)導體芯片(pian)(pian)(pian)(pian)強(qiang)烈(lie)元器(qi)件(jian)，無p-n漂移，由(you)于，可應用軟件(jian)于很多更(geng)復(fu)雜的(de)環(huan)境環(huan)境。傳紅外感應器(qi)器(qi)由(you)雙膜片(pian)(pian)(pian)(pian)構造(zao)：鈦(tai)各(ge)(ge)種(zhong)耐熱(re)各(ge)(ge)種(zhong)和(he)(he)金(jin)校(xiao)正膜片(pian)(pian)(pian)(pian)和(he)(he)鈦(tai)各(ge)(ge)種(zhong)耐熱(re)各(ge)(ge)種(zhong)和(he)(he)金(jin)考慮(lv)(lv)膜片(pian)(pian)(pian)(pian)。數(shu)碼(ma)打印(yin)有異質概念性應對靈活(huo)電(dian)橋(qiao)電(dian)線系(xi)統的(de)藍輝(hui)石(shi)(shi)膜片(pian)(pian)(pian)(pian)，被熔焊(han)在鈦(tai)各(ge)(ge)種(zhong)耐熱(re)各(ge)(ge)種(zhong)和(he)(he)金(jin)校(xiao)正膜片(pian)(pian)(pian)(pian)上(shang)。被測氣(qi)壓拷貝到考慮(lv)(lv)膜片(pian)(pian)(pian)(pian)上(shang)。在氣(qi)壓的(de)能力(li)(li)下(xia)，鈦(tai)各(ge)(ge)種(zhong)耐熱(re)各(ge)(ge)種(zhong)和(he)(he)金(jin)考慮(lv)(lv)膜片(pian)(pian)(pian)(pian)呈現(xian)(xian)(xian)(xian)變形，該(gai)變形被硅(gui)(gui)-藍輝(hui)石(shi)(shi)強(qiang)烈(lie)元器(qi)件(jian)視(shi)覺記憶(yi)后，其電(dian)橋(qiao)的(de)打印(yin)輸出(chu)會(hui)會(hui)出(chu)現(xian)(xian)(xian)(xian)影(ying)響，影(ying)響的(de)降幅(fu)與被測氣(qi)壓成比例(li)。電(dian)橋(qiao)電(dian)線系(xi)統將電(dian)橋(qiao)的(de)平(ping)衡移動數(shu)據，準換為相電(dian)壓移動數(shu)據的(de)打印(yin)輸出(chu)。